Inverse Synthesis of Phase-Shifting Mask for Optical Lithography
نویسندگان
چکیده
We applied an inverse synthesis method to design phase-shifting mask (PSM) via gradient descent optimization under the coherent illumination assumption. The synthesized PSMs have high fidelity and sharp image slope. ©2007 Optical Society of America OCIS codes: (100.3190) Inverse problems; (110.5220) Photolithography
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تاریخ انتشار 2007